氫氧化鉀是我們?cè)诔踔械臅r(shí)候就了解過(guò)的一種堿性物質(zhì)，而且在很多的領(lǐng)域當(dāng)中都是擁有非常好的使用效果，可以在其進(jìn)行使用的時(shí)候有人會(huì)疑問(wèn)它和鎂合金的微弧氧化有關(guān)系嗎，，那么我們今天來(lái)從這一個(gè)方面來(lái)講述一下這兩者之間的關(guān)系吧。
Potassium hydroxide is an alkaline substance we knew in junior high school, and it has very good use effects in many fields. When it can be used, some people will question whether it has anything to do with the micro arc oxidation of magnesium alloy. Let's talk about the relationship between the two from this aspect today.
當(dāng)微弧氧化程度降低的時(shí)候會(huì)在金屬表面產(chǎn)生微弧光，而之所以會(huì)產(chǎn)生微弧光和使用到電壓的電導(dǎo)率是有直接關(guān)系的。當(dāng)電解質(zhì)的導(dǎo)電率更高的時(shí)候在轉(zhuǎn)移或者是遷移等離子體的時(shí)候效果更好一些，并且在這個(gè)過(guò)程的當(dāng)中膜層的表面會(huì)更加容易的出現(xiàn)一些電弧光，所以在使用的時(shí)候降低外部增加的電壓來(lái)減少產(chǎn)生的微弧光。
When the degree of micro arc oxidation decreases, micro arc light will be generated on the metal surface, and the reason for the generation of micro arc light is directly related to the conductivity of the voltage. When the conductivity of the electrolyte is higher, the effect is better when transferring or migrating the plasma, and some electric arc light will appear more easily on the surface of the film in this process. Therefore, when using, reduce the external increased voltage to reduce the generated micro arc light.

在硅酸鹽的溶液當(dāng)中添加進(jìn)去適量濃度的氫氧化鉀那么會(huì)發(fā)現(xiàn)氧化膜的厚度是又出現(xiàn)變化的。氧化膜層的厚度是隨著濃度的增加而進(jìn)行增加的，不過(guò)等到濃度在增加到一定程度的時(shí)候厚度增加的頻率是會(huì)慢慢降低的，等到在濃度逐漸的增加到一定程度之后厚度是已經(jīng)沒(méi)有變化了。所以我們可以看出來(lái)濃度再進(jìn)行增加的時(shí)候膜層的也是在逐步進(jìn)行增加的。
If an appropriate concentration of potassium hydroxide is added to the silicate solution, it will be found that the thickness of the oxide film changes again. The thickness of oxide film increases with the increase of concentration, but the frequency of thickness increase will slowly decrease when the concentration increases to a certain extent, and the thickness has not changed after the concentration gradually increases to a certain extent. Therefore, we can see that when the concentration increases again, the of the film is also gradually increasing.
初次之外我們還會(huì)發(fā)現(xiàn)在硅酸鹽溶液當(dāng)中可以堿性物質(zhì)濃度較低的時(shí)候依然是可以正常進(jìn)行氧化成膜的。所以其實(shí)堿性物質(zhì)在添加進(jìn)去的時(shí)候是可以影響膜生成的效率的。
For the first time, we will also find that when the concentration of alkaline substances in silicate solution is low, it can still be oxidized into film normally. Therefore, in fact, when alkaline substances are added, they can affect the efficiency of membrane formation.
上面介紹的就是氫氧化鉀和鎂合金氧化之間的關(guān)系，其實(shí)我們?cè)诟由钊氲牧私膺^(guò)這個(gè)內(nèi)容之后可以更好的對(duì)堿性物質(zhì)進(jìn)行應(yīng)用，并且在使用各種材料的時(shí)候也是需要選擇更加合適的方式。
The above describes the relationship between potassium hydroxide and magnesium alloy oxidation. In fact, after a deeper understanding of this content, we can better apply alkaline substances, and we also need to choose a more appropriate way when using various materials.